White light interferometry, owing to its non-contact feature, high precision, and high adaptability, has been widely applied in micro-nano manufacturing and advanced equipment inspection. However, in practical measurement, interferograms are often affected by multiple factors such as light source instability, scanner nonlinearity, and environmental disturbances, leading to increased phase noise and reduced measurement accuracy and robustness. This work summarizes our research group""s studies on phase noise analysis and suppression in white light interferometry, where several comprehensive multi-source phase noise models have been established to address random fluctuations, dispersion errors, and vibration effects. Corresponding noise suppression strategies are proposed, significantly enhancing measurement stability and resolution. Experimental validations on standard samples, semiconductor devices, and metal structures demonstrate the proposed methods"" effectiveness in phase noise reduction and accuracy improvement, indicating strong potential for applications in advanced manufacturing.