Spectral-domain interferometry has been widely applied in base station degree-of-freedom measurement, probe-type fiber optic sensing, and biological tissue imaging. To decouple target parameters, it is typically necessary to acquire magnitude responses across the spectrum. By detecting periodic spectral fringe frequencies and combining phase information at each optical frequency, followed by algorithmic iteration, micro/nano-scale measurements can be achieved. However, current full-field spectral-domain interferometry relies on wavelength or galvanometer scanning, which limits its ability to capture full-field information in a single acquisition. Digital micromirror devices (DMDs) feature high resolution, fast measurement speed, and flexible programmability. To address this challenge, this paper proposes a full-field spectral-domain interferometry technique based on a digital micromirror device. By leveraging spatial light field encoding and decoding, the system enables full-field spectral detection, with applications in both spectral interferometric distance measurement and spectroscopic ellipsometry for thin-film thickness measurement, demonstrating its potential in micro/nano topography characterization. The proposed method is particularly suitable for rapid 3D structure recovery and reconstruction of sparse surfaces, eliminating the need for wavelength or galvanometer scanning and significantly improving full-field measurement efficiency. Potential applications include thickness and morphology characterization of polished wafers, silicon-on-insulator (SOI) substrates, and bonded interfaces.