Micro?nano detection technology aims to measure the characteristics of machined surface with micro/nano measurement accuracy, which plays an important role in controlling the machining process and establishing the relationship between surface characteristics and functions. Optical measurement method is an important part of micro?nano detection technology because of its high accuracy, fast speed and non?destructiveness. This paper introduces the common optical measurement methods of surface topography and film parameters, and compares and summarizes the characteristics and application occasions of each method in detail. The surface processed by micro?nano manufacturing technology has the development trend of miniaturization of structure and complexity of characteristics. Therefore, it is of great significance to build the multi-mode measurement system for micro?nano detection technology.