Because of the small measurement range and long measurement time, the traditional detection methods can not meet the requirements of on?line, in?machine and large?format detection. In this paper, a chip surface morphology measurement method combining white light scanning interferometry and atomic force microscopy is presented. Based on the analysis of the characteristics of white light scanning interferometry and atomic force microscopy, a measurement scheme with two complementary methods was constructed. Firstly, the white light scanning interferometry was used to scan and inspect the chip in a large range with a high speed, and then the atomic force microscopy was used to measure the key areas by fine scanning. The measurement system was designed and integrated. The testing results showed that the system can accurately detect the nano?scale surface morphology in a range of millimeter.